NikkoIA uses new photodetection materials which are deposited as a thin film layer onto industry-standard electronic reading substrates.

Photodetection material

The photodetection material is sensitive to visible and infrared light and generates an electrical signal based on the absorbed infrared light. It is made of both organic and inorganic components sensitive to specific wavelengths and can be easily tuned by modifying the nature and mix of these components. This enables great sensitivity either to a precise and specific wavelength or to a large range of wavelengths from the visible and near infrared spectrum.

Electrical signal reading

The electrical signal is read by common market reading substrates: active or passive amorphous Silicon thin-film transistor backplanes, CMOS substrates or printed electronics flexible substrates in the future. The material is deposited by extremely simple, mature and robust processes such as spray or spin coating, which ensures leverage from the latest technical developments on reading substrates and the best market costs.

Initially developed by Siemens Corporate Technology, this technology brings extremely competitive solutions vs. current InGaAs-based products and opens new opportunities for near infrared image sensors. NikkoIA SAS owns a worldwide and exclusive license on an extensive patents portfolio related to this technology and will focus on the visible (400 – 800nm) to near-infrared (up to 3000nm) area of the spectrum.